Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films

被引：21
|
作者：
Rios, S. [1 ]
Karaman, I. [1 ]
Zhang, X. [1 ]
机构：
[1] Texas A&M Univ, Dept Mech Engn, Mat Sci & Engn Program, College Stn, TX 77843 USA
来源：
APPLIED PHYSICS LETTERS | 2010年 / 96卷 / 17期
关键词：
amorphous state; annealing; cobalt alloys; crystallisation; differential scanning calorimetry; hysteresis; indium alloys; manganese alloys; metallic thin films; nickel alloys; reverse martensitic transformations; shape memory effects; transmission electron microscopy; INDUCED PHASE-TRANSFORMATION; MAGNETIC-FIELD; SINGLE-CRYSTALS; ALLOYS; NI2MNGA;
D O I：
10.1063/1.3407670
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Amorphous Ni(50)Mn(38)Co(6)In(6) films of 20 mu m in thickness are fabricated using dc magnetron sputtering technique. Ex situ annealing studies demonstrate the crystallization at elevated temperature, and the retention of L1(0) martensite at room temperature. In situ annealing inside a transmission electron microscope reveals the crystallization process as well as the transformation to B2 austenite at elevated temperatures. Differential scanning calorimetry studies show the crystallization activation energy of similar to 239 kJ/mol, a reversible martensitic phase transformation temperature of similar to 350 degrees C, and a hysteresis of similar to 75 degrees C.
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页数：3
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