Structural characterization of rapid thermally oxidized silicon-germanium-carbon alloy films

被引：2
|
作者：
Choi, WK
Bera, LK
Chen, JH
Feng, W
Pey, KL
Yoong, H
Mi, J
Zhang, F
Yang, CY
机构：
[1] Natl Univ Singapore, Dept Elect Engn, Microelect Lab, Singapore 117576, Singapore
[2] Santa Clara Univ, Microelect Lab, Santa Clara, CA 95053 USA
来源：
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2000年 / 75卷 / 2-3期
关键词：
silicon-germanium-carbon alloy films; rapid thermally oxidized film; X-ray diffraction spectroscopy; Raman spectroscopy;
D O I：
10.1016/S0921-5107(00)00359-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The properties of as-prepared and rapidly thermally oxidized Si1-x-yGexCy. alloy films have been examined using infrared, X-ray diffraction, and Raman techniques. The structural properties of the oxidized Si1-x-yGexCy film depend on the type of strain of the as-prepared film. For compressive or fully compensated films, the oxidation process drastically reduces the carbon content such that the oxidized film compositions resemble that of Si1-xGex films. For tensile films, two broad layers co-exist in the oxidized films, one with a carbon content higher and the other lower than that required for full strain compensation. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：184 / 186
页数：3
相关论文
共 50 条
  • [1] UV-laser-assisted processing of thin silicon-germanium-carbon films
    López, E.
    Chiussi, S.
    Serra, J.
    González, P.
    León, B.
    THIN SOLID FILMS, 2006, 508 (1-2) : 48 - 52
  • [2] NOVEL CHEMICAL ROUTES TO SILICON-GERMANIUM-CARBON MATERIALS
    KOUVETAKIS, J
    TODD, M
    CHANDRASEKHAR, D
    SMITH, DJ
    APPLIED PHYSICS LETTERS, 1994, 65 (23) : 2960 - 2962
  • [3] Microstructural and elastic properties of silicon-germanium-carbon alloys
    Kelires, PC
    APPLIED SURFACE SCIENCE, 1996, 102 : 12 - 16
  • [4] Applications of silicon-germanium-carbon in MOS and bipolar transistors
    Banerjee, S
    MICROELECTRONIC DEVICE TECHNOLOGY, 1997, 3212 : 118 - 128
  • [5] Microstructural and elastic properties of silicon-germanium-carbon alloys
    Univ of Crete, Crete, Greece
    Appl Surf Sci, (12-16):
  • [6] Potential for silicon-germanium-carbon HBT operation at cryogenic temperatures
    Jayanarayanan, S
    Cressler, JD
    Richey, DM
    PROCEEDINGS OF THE FOURTH SYMPOSIUM ON LOW TEMPERATURE ELECTRONICS AND HIGH TEMPERATURE SUPERCONDUCTIVITY, 1997, 97 (02): : 240 - 245
  • [7] STRUCTURAL AND OPTICAL CHARACTERIZATION OF THERMALLY OXIDIZED BISMUTH FILMS
    Condurache-Bota, Simona
    Rusu, Gheorghe I.
    Tigau, Nicolae
    Drasovean, Romana
    Gheorghies, Constantin
    REVUE ROUMAINE DE CHIMIE, 2009, 54 (03) : 205 - 211
  • [8] SILICON-GERMANIUM-CARBON ALLOYS EXTENDING SI BASED HETEROSTRUCTURE ENGINEERING
    POWELL, AR
    IYER, SS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B): : 2388 - 2391
  • [9] Silicon-germanium-carbon alloys extending Si based heterostructure engineering
    Powell, Adrian R.
    Iyer, Subramanian S.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (4 B): : 2288 - 2391
  • [10] STUDY OF THERMALLY OXIDIZED YTTRIUM FILMS ON SILICON
    GURVITCH, M
    MANCHANDA, L
    GIBSON, JM
    APPLIED PHYSICS LETTERS, 1987, 51 (12) : 919 - 921
12345