Uniformity measurement of electron emission from carbon nanotubes using electron beam resist

被引：0
|
作者：
Lee, JH [1 ]
Lee, SH [1 ]
Kim, WS [1 ]
Lee, HJ [1 ]
Heo, JN [1 ]
Jeong, TW [1 ]
Choi, CH [1 ]
Kim, JM [1 ]
Park, JH [1 ]
Ha, JS [1 ]
Lee, HJ [1 ]
Moon, JW [1 ]
Yoo, MA [1 ]
Nam, JW [1 ]
Cho, SH [1 ]
Yoon, TI [1 ]
Choe, DH [1 ]
机构：
[1] Samsung Adv Inst Technol, Natl Creat Res Initiat Ctr Elect Emmiss Source, Suwon 440600, South Korea
来源：
TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE | 2004年
关键词：
D O I：
10.1109/IVNC.2004.1354896
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：56 / 57
页数：2
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