Recent progress in electron beam mastering for 100Gb/in2 and beyond

被引：0

作者：

Furuki, M ^{[1
]}

Takeda, M ^{[1
]}

Yamamoto, M ^{[1
]}

Saito, K ^{[1
]}

Shinoda, M ^{[1
]}

Fujiki, T ^{[1
]}

Aki, Y ^{[1
]}

机构：

[1] Sony Corp, HENC, Opt Syst Dev Div, Storage Technol Dept,Shinagawa Ku, Tokyo 1410001, Japan

来源：

OPTICAL DATA STORAGE 2004 | 2004年 / 5380卷

关键词：

electron beam mastering; near-field optical pick-up; reactive ion etching; a write strategy;

D O I：

10.1117/12.562121

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

We improved the electron beam recorder with a differential pumping head for higher density discs and mass production. The beam diameters were improved by exchanging the aperture size of the objective lens and beam stability were also improved by adding a sound proof case. As for the performance of the improved electron beam recorder, we showed that a 104Gb/in(2) (150GB capacity/layer) density disc with EFM plus modulation codes can be fabricated. We also improved the pit shape uniformity and a margin of the process by introducing the appropriate write strategy that is simulated by the Monte Carlo simulation to the recording pulses.

引用

页码：47 / 55

页数：9

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