On the formation of well-aligned ZnO nanowall networks by catalyst-free thermal evaporation method

被引:35
|
作者
Yin, Zhigang [1 ]
Chen, Nuofu
Dai, Ruixuan
Liu, Lei
Zhang, Xingwang
Wang, Xiaohui
Wu, Jinliang
Chai, Chunlin
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Mech, Natl Micrograv Lab, Beijing 100080, Peoples R China
基金
中国国家自然科学基金;
关键词
nanostructures; physical vapor deposition processes; ZnO; semiconducting materials;
D O I
10.1016/j.jcrysgro.2007.04.043
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Two-dimensional ZnO nanowall networks were grown on ZnO-coated silicon by thermal evaporation at low temperature without catalysts or additives. All of the results from scanning electronic spectroscope, X-ray diffraction and Raman scattering confirmed that the ZnO nanowalls were vertically aligned and c-axis oriented. The room-temperature photoluminescence spectra showed a dominated UV peak at 378 nm, and a much suppressed orange emission centered at similar to 590 nm. This demonstrates fairly good crystal quality and optical properties of the product. A possible three-step, zinc vapor-controlled process was proposed to explain the growth of well-aligned ZnO nanowall networks. The pre-coated ZnO template layer plays a key role during the synthesis process, which guides the growth direction of the synthesized products. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:296 / 301
页数:6
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