The pitting behavior of iron-chromium thin film alloys in hydrochloric acid

被引:32
|
作者
Ryan, MP [1 ]
Laycock, NJ
Newman, RC
Isaacs, HS
机构
[1] Brookhaven Natl Lab, Dept Appl Sci, Upton, NY 11973 USA
[2] Univ Manchester, Inst Sci & Technol, Ctr Corros & Protect, Manchester M60 1QD, Lancs, England
关键词
D O I
10.1149/1.1838519
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The pitting behavior of a range of iron-chromium thin film alloys which are sulfide-free has been studied by electrochemical methods coupled with in situ optical microscopy. In 0.5 M HCl, iron-chromium alloys with > similar to 16 atom % chromium do not pit at any potential, whereas alloys with < similar to 16 atom % chromium pit at approximately +500 mV standard calomel electrode. The sharp transition is believed to be associated with the existence of a critical size of iron cluster which act as pit nucleation sites. This is modeled by the achievement of a high density percolation condition for iron in the body-centered cubic alloy. The pits propagate under remnants of the passive film as two-dimensional disks, with current densities up to 80 A cm(-2) and simultaneous hydrogen evolution.
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页码:1566 / 1571
页数:6
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