Surface modification of silicone medical materials by plasma-based ion implantation

被引：6

作者：

Kobayashi, Tomohiro ^{[1
]}

Yokota, Toshihiko

Kato, Rul

Suzuki, Yoshiaki

Iwaki, Masaya

Terai, Takayuki

Takahashi, Noriyoshi

Miyasato, Tomonori

Ujiile, Hiroshi

机构：

[1] RIKEN, Inst Phys & Chem Res, Saitama 3510198, Japan

[2] Univ Tokyo, Tokyo 1130033, Japan

[3] Tokyo Univ Sci, Tokyo 1628601, Japan

[4] Yaesekai Dojin Hosp, Okinawa 9012133, Japan

[5] Tokyo Womens Med Univ, Tokyo 1628666, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 257卷 / 128-131期

关键词：

plasma-based ion implantation; PBII; silicone; carbonization; biocompatibility; cell attachment;

D O I：

10.1016/j.nimb.2006.12.158

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Silicone (polydimethylsiloxane) sheets and tubes for medical use were irradiated with inert gas ions using plasma-based ion implantation (PBII). The affinity of the surface with tissue examined by an animal test was improved by the irradiation at optimal conditions. The cell attachment percentage increased at an applied voltage of less than -7.5 kV; however, it decreased at higher voltage. The specimens irradiated at higher voltages were more hydrophobic than unirradiated specimens. The surface became rough with increasing voltage and textures, and small domains appeared. This effect was caused by different etching speeds in the amorphous and crystalline areas. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：128 / 131

页数：4

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