Photochemical lamination of low refractive index transparent SiO2 film at room temperature for antireflection coating

被引：0

作者：

Ogawa, Y ^{[1
]}

Murahara, M ^{[1
]}

机构：

[1] Tokai Univ, Dept Elect Engn, Kanagawa 25912, Japan

来源：

SURFACE ENGINEERING 2002-SYNTHESIS, CHARACTERIZATION AND APPLICATIONS | 2003年 / 750卷

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

A transparent low refractive index SiO2 film laminated on a glass substrate at room temperature by photochemical reactions with the Xe-2(*) excimer lamp (172nm). This SiO2 film grown on the fused silica glass was proved to avoid reflection of light. A refractive index of the SiO2 film was 1.36. After annealing the film for one hour at 200 degrees centigrade, the refractive index increased to 1.42. The refractive index increased as the F atom density in the SiO2 film decreased.

引用

页码：419 / 424

页数：6

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