Ab Initio Study of Xe Adsorption on Graphene

被引:50
|
作者
Sheng, Li [1 ,2 ]
Ono, Yuriko [2 ]
Taketsugu, Tetsuya [2 ]
机构
[1] Harbin Inst Technol, Dept Chem, Nat Sci Res Ctr, Acad Fundamental & Interdisciplinary Sci, Harbin 150080, Peoples R China
[2] Hokkaido Univ, Grad Sch Sci, Div Chem, Sapporo, Hokkaido 0600810, Japan
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2010年 / 114卷 / 08期
基金
日本学术振兴会; 美国国家科学基金会;
关键词
ENERGY-ELECTRON DIFFRACTION; ADSORBATE LAYERS; RARE-GASES; BASIS-SETS; GRAPHITE; ATOMS; PHYSISORPTION; COMPLEXES; GEOMETRY; HYDROGEN;
D O I
10.1021/jp907861c
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of Xe on graphene has been systematically investigated by ab initio MP2 calculations Using Dunning's correlation-consistent basis sets. The polycyclic aromatic hydrocarbon (i.e., coronene) is employed to model the graphene surface. The adsorption energies at three high-symmetry sites oil the surface are calculated at the MP2/cc-pVTZ/cc-pVDZ-PP level. Our results show that Xe preferentially occupies the hollow site oil the graphene surface. The equilibrium distance of Xe at the hollow site is calculated as 3.56 angstrom, which is ill excellent agreement with the available experimental value of 3.59 +/- 0.05 angstrom. The corresponding binding energy at the hollow site is calculated as -142.9 meV, whereas the binding energies at the bridge and on-top sites are calculated as -130.8 and -127.4 meV, respectively. The adsorption of polar molecules, XeF and XeBeO, on graphene is also investigated to analyze the site preference.
引用
收藏
页码:3544 / 3548
页数:5
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