Electron-beam-induced-current and active secondary-electron voltage-contrast with aberration-corrected electron probes (vol 177, pg 14, 2017)

被引:3
|
作者
Han, Myung-Geun
机构
[1] Condensed Matter Physics & Materials Science, Brookhaven National Laboratory, Upton, 11973, NY
[2] Materials Science and Engineering Department, Stony Brook University, 11794, NY
[3] Department of Chemistry, Stony Brook University, 11794, NY
[4] Department of Physics and Astronomy, Rutgers Center for Emergent Materials, Rutgers University, 08854, NJ
[5] Department of Applied Physics and Center for Research on Interface Structures and Phenomena, Yale University, New Haven, 06520, CT
[6] Department of Mechanical Engineering and Materials Science, Yale University, New Haven, 06520, CT
关键词
Electric biasing; Electron holography; Electrostatic potential; Ferroelectric;
D O I
10.1016/j.ultramic.2017.01.016
中图分类号
TH742 [显微镜];
学科分类号
摘要
The ability to map out electrostatic potentials in materials is critical for the development and the design of nanoscale electronic and spintronic devices in modern industry. Electron holography has been an important tool for revealing electric and magnetic field distributions in microelectronics and magnetic-based memory devices, however, its utility is hindered by several practical constraints, such as charging artifacts and limitations in sensitivity and in field of view. In this article, we report electron-beam-induced-current (EBIC) and secondary-electron voltage-contrast (SE-VC) with an aberration-corrected electron probe in a transmission electron microscope (TEM), as complementary techniques to electron holography, to measure electric fields and surface potentials, respectively. These two techniques were applied to ferroelectric thin films, multiferroic nanowires, and single crystals. Electrostatic potential maps obtained by off-axis electron holography were compared with EBIC and SE-VC to show that these techniques can be used as a complementary approach to validate quantitative results obtained from electron holography analysis. © 2017
引用
收藏
页码:14 / 14
页数:1
相关论文
共 12 条
  • [1] Electron-beam-induced-current and active secondary-electron voltage-contrast with aberration-corrected electron probes
    Han, Myung-Geun
    Garlow, Joseph A.
    Marshall, Matthew S. J.
    Tiano, Amanda L.
    Wong, Stanislaus S.
    Cheong, Sang-Wook
    Walker, Frederick J.
    Ahn, Charles H.
    Zhu, Yimei
    ULTRAMICROSCOPY, 2017, 176 : 80 - 85
  • [2] ON THE ORIGIN OF ELECTRON-BEAM-INDUCED-CURRENT CONTRAST OF EXTENDED DEFECTS IN SILICON
    KITTLER, M
    SEIFERT, W
    SCANNING MICROSCOPY, 1992, 6 (04) : 979 - 991
  • [3] Recombination at the interface between a metallic precipitate and a semiconductor matrix: Application to the electron-beam-induced-current contrast
    Debez, M.
    Tarento, R. -J.
    Mekki, D. E.
    SUPERLATTICES AND MICROSTRUCTURES, 2009, 45 (4-5) : 469 - 474
  • [4] ELECTRON-BEAM INDUCED CURRENT (EBIC) AND VOLTAGE CONTRAST MODES IN SEMICONDUCTORS DEVICES
    BRESSE, JF
    JOURNAL DE MICROSCOPIE ET DE SPECTROSCOPIE ELECTRONIQUES, 1981, 6 (01): : 17 - 36
  • [5] Contrast Mechanisms in Secondary Electron e-Beam Induced Current (SEEBIC) Imaging
    Dyck, Ondrej
    Swett, Jacob L.
    Evangeli, Charalambos
    Lupini, Andrew R.
    Mol, Jan
    Jesse, Stephen
    MICROSCOPY AND MICROANALYSIS, 2022, 28 (05) : 1567 - 1583
  • [6] A comprehensive Monte Carlo calculation of dopant contrast in secondary-electron imaging (vol 82, pg 30006, 2008)
    Dapor, Maurizio
    Inkson, B. J.
    Rodenburg, C.
    Rodenburg, J. M.
    EPL, 2008, 82 (04)
  • [7] Depletion of superjunction power MOSFETs visualized by electron beam induced current and voltage contrast measurements
    Kirnstoetter, Stefan
    Faccinelli, Martin
    Jelinek, Moriz
    Schustereder, Werner
    Laven, Johannes G.
    Schulze, Hans-Joachim
    Hadley, Peter
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 11, NO 11-12, 2014, 11 (11-12): : 1707 - 1710
  • [9] Comparison between Secondary Electron Microscopy Dopant Contrast Image (SEMDCI) and Electron Beam Induced Current (EBIC) for laser doping of crystalline silicon
    Xu, Lujia
    Hameiri, Ziv
    Weber, Klaus
    Yang, Xinbo
    PROCEEDINGS OF THE 4TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2014), 2014, 55 : 179 - 185
  • [10] Modelling focused electron beam induced deposition beyond Langmuir adsorption (vol 8, pg 2151, 2017)
    Sanz-Hernandez, Desalo
    Fernandez-Pacheco, Amalio
    BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2017, 8 : 2591 - 2591