Optimization of fabrication prarameters of Al2O3:Ce3+ films prepared by medium frequency reactive magnetron sputtering

被引：0

作者：

Liao, Guojin ^{[1
]}

Ba, Dechun ^{[1
]}

Wen, Lishi ^{[1
]}

Liu, Siming ^{[1
]}

Yan, Shaofeng ^{[1
]}

机构：

[1] Northeastern Univ, Fac Mech Engn & Automat, Shenyang 110004, Peoples R China

来源：

VACUUM METALLURGY AND SURFACE ENGINEERING, PROCEEDINGS | 2007年

关键词：

magnetron sputtering; Al2O2 : Ce3+; thin films; luminescence; orthogonal; experiment; optimized fabrication;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Medium Frequency Reactive Magnetron sputtering (MFRMS) is being widely used in many fields. Al-2 01: Ce3+ films prepared by MFRMS have better luminescent characters. Al-2 01: Ce3+ films deposited by MFRMS technology are studied on luminescence in the way of the four-factor and four-level orthogonal experimental method. It is found that the optimized fabrication parameters of Al2O3:Ce3+ thin films with good luminescent properties are that cerium doping concentration is 1.1 at. %, the distance of the targets and substrate is 70 mm, the oxygen partial pressure rate is 9%, and the sputtering pressure is 0.4 Pa. The experimental results shows that the Al-2, 03: Cc 31 films prepared by MFRMS technology have good wide bend emitting property.

引用

页码：161 / 166

页数：6

共 17 条

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