Patterned grafting of polymer brushes onto flexible polymer substrates

被引:22
|
作者
Padeste, C [1 ]
Solak, HH
Brack, HP
Slaski, M
Gürsel, SA
Scherer, GG
机构
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] Paul Scherrer Inst, Electrochem Lab, CH-5232 Villigen, Switzerland
来源
关键词
D O I
10.1116/1.1805542
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Selective exposure of polymer substrates to extreme ultraviolet (EUV) radiation followed by graft polymerization of a second polymer is used to create patterns of polymer brushes. A key feature of this additive structuring process is the possibility to combine the properties of a polymer substrate in precisely p redefined regions with the properties of the grafted material. Styrene brushes were grafted onto poly(ethylene-alt-tetrafluoroethylene) (ETFE) substrates after exposure to synchrotron EUV radiation in an interference lithographic setup. The grafted chains are covalently bound to the surface, which allows physical or chemical post-processing without deterioration of the grafted structures. (C) 2004 American Vacuum Society.
引用
收藏
页码:3191 / 3195
页数:5
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