Boron-carbide barrier layers in scandium-silicon multilayers

被引:21
|
作者
Jankowski, AF [1 ]
Saw, CK [1 ]
Walton, CC [1 ]
Hayes, JP [1 ]
Nilsen, J [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
关键词
boron-carbide; multilayer; scandium-silicon; diffusion barrier; reflectivity;
D O I
10.1016/j.tsf.2004.08.153
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Scandium-silicon (Sc/Si) multilayer structures show promise to efficiently reflect 45-50-nm wavelength X-rays at normal incidence. Barrier layers have been added at each interface to minimize the formation and growth of silicide compounds that broaden interfaces and, consequently, cause a change in the layer spacing and loss of reflectivity. Although tungsten (W) is an effective diffusion barrier, its high absorption causes a loss of reflectivity. We now evaluate the use of another refractory material for the barrier layer, boron carbide (B4C), which is a stable ceramic. The multilayer microstructure and its stability are evaluated using microscopy and diffraction methods. It is found that the use of B4C enhances the thermal stability of Sc/Si multilayers to an extent equivalent that offered by W barrier layers with only a few percent reduction in the reflectivity. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:372 / 376
页数:5
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