The effect of substrate bias on the characteristics of CrN coatings deposited by DC-superimposed HiPIMS system

被引：4
|
作者：
Zuo, X. [1 ,2 ]
Xia, F. [1 ,2 ,3 ]
Zhang, D. [1 ,2 ]
Ke, P. L. [1 ,2 ]
Wang, Q. M. [3 ]
Wang, A. Y. [1 ,2 ]
机构：
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Marine Mat & Related Technol, Ningbo 315201, Zhejiang, Peoples R China
[2] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo 315201, Zhejiang, Peoples R China
[3] Guangdong Univ Technol, Sch Electromech Engn, Guangzhou 510006, Guangdong, Peoples R China
来源：
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2017年 / 31卷 / 16-19期
基金：
中国国家自然科学基金;
关键词：
HiPIMS; CrN coatings; substrate bias; microstructure; fracture toughness; CATHODIC ARC; VOLTAGE; FILMS;
D O I：
10.1142/S0217979217440325
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Chromium nitride coatings were prepared by reactive DC-superimposed high-power impulse magnetron sputtering (HiPIMS) system. The influence of substrate bias on the microstructure and mechanical properties of CrN coatings was investigated. XRD and cross-sectional SEM were utilized to characterize the film structures. Mechanical properties were characterized by nanoindentation and Vickers indentation test. The results revealed that the microstructure and mechanical properties of CrN coatings were affected by bias voltage. The CrN coatings exhibited dense and fine columnar grain structure with the hardness of about 18.7 GPa. The fracture toughness of CrN coatings was around 3.16 MPa . m(1/2). However, further increase of the bias voltage from -250 V to -300 V led to the degradation of coating properties.
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页数：5
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