Managing Overall Equipment Effectiveness [OEE] to optimize factory performance

被引:11
|
作者
Pomorski, T [1 ]
机构
[1] Farichild Semicond, S Portland, ME 04106 USA
关键词
D O I
10.1109/ISSM.1997.664488
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Overall Equipment Effectiveness (OEE) is the key metric of Total Productive Manufacturing (TPM). OEE monitors the actual performance of a tool relative to it's performance capabilities under optimal manufacturing conditions. OEE looks at the entire manufacturing environment measuring, not only the equipment availability, but also, the production efficiency while the equipment is available to run product, as well as the efficiency loss that results fi om scrap, rework and yield losses. Analysis of the equipment effectiveness loss mechanisms provides the user with improvement opportunities for the operation. This paper focuses on the use of OEE and major equipment loss analysis to optimize the performance of constraint tools at Fairchild Semiconductor, South Portland, Maine. Factory modeling is a key element of the OEE management process, defining the equipment and process capabilities at the workstation (micro) level then identifying constraint tools and OEE performance requirements through macro level factory capacity modeling. Also discussed in this paper, is the SEMI productivity metrics standard proposal which defines OEE and loss analysis methods which are consistent with SEMI E10-96 concepts.
引用
收藏
页码:A33 / A36
页数:4
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