Preparation of sapphire for high quality III-nitride growth

被引:0
|
作者
Cui, J [1 ]
Sun, A
Reshichkov, M
Yun, F
Baski, A
Morkoç, H
机构
[1] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[2] Virginia Commonwealth Univ, Dept Phys, Richmond, VA 23284 USA
来源
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH | 2000年 / 5卷 / 07期
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We developed a unique preparation technique to eliminate surface damage on the c-plane of sapphire and render it atomically flat. AFM images of c-plane sapphire annealed at 1380 degreesC for 1 hour show terrace-like features with about 0.2 mum long terraces. The GaN layers grown by MBE on annealed sapphire have [0 0 2] symmetric and [1 0 4] asymmetric full width at half maximum (FWHM) of about 60 and 132 arcsec, respectively. This compares with 408 and 600 arcsec, respectively, for GaN grown on sapphire having gone through conventional chemical cleaning.
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页码:1 / 6
页数:6
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