Photocatalytic TiO2 films deposited by sputtering for "self-cleaning smart windows"

被引：0
|
作者：
Yamagishi, M [1 ]
Irie, Y [1 ]
Miyatake, S [1 ]
Kuriki, S [1 ]
Song, PK [1 ]
Shigesato, Y [1 ]
机构：
[1] Aoyama Gakuin Univ, Coll Sci & Engn, Setagaya Ku, Tokyo, Japan
来源：
PRICM 4: FORTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, VOLS I AND II | 2001年
关键词：
titanium dioxide (TiO2); photocatalysis; reactive sputtering; hydrophilicity; self-clearning;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Titanium dioxide (TiO2) films were deposited by 2 different kinds of substrates, (a) non-alkari glass and (b) STO (100) single crystals, by rf magnetron sputtering using a Ti metal target. X-ray diffraction and a pole figure analysis revealed that all the TiO2 films deposited on the glass substrate under 0.3 - 3.0Pa were anatase polycrystals with <101> preferred orientation, whereas heteroepitaxial growth of anatase TiO2 was observed on the STO substrates. The heteroepitaxial relationship was TiO2 (001)[100]//STO (100)[001]. The films deposited on the glass at high total gas pressure of 3.0 Pa were confirmed to show excellent photocatalytic properties and photo-induced hydrophilicity.
引用
收藏
页码：1771 / 1772
页数：2
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