Preparation of a thin silicon membrane for transmission electron microscopy

被引：0
|
作者：
Shengurov, VG
Perevoshchikov, VA
Skupov, VD
Shengurov, DV
机构：
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 1997年 / 40卷 / 02期
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A technique for preparing preselected local areas on a silicon wafer for transmission electron microscopy studies is described. The method yields mechanically strong specimens with membranes (foils) transparent for electrons. A crystal is thinned by the local formation of a porous silicon layer, which is subsequently removed by being dissolved in a solution of potassium hydroxide. The resultant recessed regions are brought to the required thickness with the chemicodynamic polishing technique.
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页码：283 / 284
页数：2
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