Spectrally Selective Chiral Silicon Metasurfaces Based on Infrared Fano Resonances

被引:0
|
作者
Wu, Chihhui [1 ]
Arju, Nihal [1 ]
Fan, Jonathan [4 ]
Brener, Igal [2 ,3 ]
Shvets, Gennady [1 ]
机构
[1] Univ Texas Austin, Dept Phys, Austin, TX 78712 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Sandia Natl Labs, Ctr Integrated Nanotechnol, Albuquerque, NM 87185 USA
[4] Univ Illinois, Beckman Inst, Urbana, IL 61801 USA
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon-process compatible metasurface was designed and tested in the infrared wavelength range. These metasurfaces show very high Q (>100), extreme chirality, and polarization conversion along with very low-loss operation. They show promise for sensing applications as well as spectrally selective CP thermal emitters.
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页数:2
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