Imaging polymers with supercritical carbon dioxide

被引：36
|
作者：
Ober, CK
Gabor, AH
GallagherWetmore, P
Allen, RD
机构：
[1] PHASEX CORP,LAWRENCE,MA 01843
[2] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
来源：
ADVANCED MATERIALS | 1997年 / 9卷 / 13期
关键词：
D O I：
10.1002/adma.19970091309
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Communication: In lithographic techniques for forming nanostructures in surfaces and polymer thin films, the selectivity of the solvent becomes increasingly important as the target dimensions decrease. Polymer-based resist systems are reported that use supercritical (SC) CO2 instead of water-based developers. The Figure shows the SC CO2-developed image of a copolymer of pentafluoropropyl methacrylate and tert-butyl methacrylate.
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页码：1039 / &
页数：6
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