Extending the Functionality of FDSOI N- and P-FETs to Light Sensing

被引:0
|
作者
Kadura, L.
Grenouillet, L. [1 ]
Bedecarrats, T.
Rozeau, O.
Rambal, N.
Scheiblin, P.
Tabone, C.
Blachier, D.
Faynot, O.
Chelnokov, A.
Vinet, M.
机构
[1] CEA, LETI, Minatec Campus, F-38054 Grenoble, France
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
we demonstrate that FDSOI transistors co-integrated with a diode implemented below the buried oxide (BOX) become strongly sensitive to visible light. The carriers photogenerated in the diode create a Light-Induced V-T Shift (LIVS) in both NFET & PFET transistors by means of capacitive coupling, without direct electrical connection between the photodiode and the sensing transistor. This optical back biasing effect is carefully examined as a function of both transistor and diode technological parameters. The experimental results are supported by TCAD simulations, suggesting that the proposed FDSOI/photodiode co-integration scheme can be used for efficient photodetectors. We also study the transient effects, and propose an efficient reset mechanism. Finally, we demonstrate for the first time that SRAM cells can be made controllable by light illumination.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Interface-engineered Ge (100) and (111), N- and P-FETs with high mobility
    Kuzum, Duygu
    Pethe, Abhijit J.
    Krishnamohan, Tejas
    Oshima, Yasuhiro
    Sun, Yuri
    McVittie, Jim P.
    Pianetta, Piero A.
    McIntyre, Paul C.
    Saraswat, Krishna C.
    2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2007, : 723 - 726
  • [2] Ge (100) and (111) N- and P-FETs With High Mobility and Low-T Mobility Characterization
    Kuzum, Duygu
    Pethe, Abhijit J.
    Krishnamohan, Tejas
    Saraswat, Krishna C.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (04) : 648 - 655
  • [3] High mobility CMOS: First demonstration of planar GeOI p-FETs with SOI n-FETs
    Le Royer, C.
    Damlencourt, J. -F.
    Vincent, B.
    Romanjek, K.
    Le Cunff, Y.
    Grampeix, H.
    Mazzocchi, V.
    Carron, V.
    Nemouchi, F.
    Hartmann, J. -M.
    Arvet, C.
    Vizioz, C.
    Tabone, C.
    Hutin, L.
    Batude, P.
    Vinet, M.
    SOLID-STATE ELECTRONICS, 2011, 59 (01) : 2 - 7
  • [4] Heterogeneous 3-D Sequential CFETs With Ge (110) Nanosheet p-FETs on Si (100) Bulk n-FETs
    Kim, Seong Kwang
    Lim, Hyeong-Rak
    Jeong, Jaejoong
    Lee, Seung Woo
    Jeong, Ho Jin
    Park, Juhyuk
    Kim, Joon Pyo
    Jeong, Jaeyong
    Kim, Bong Ho
    Ahn, Seung-Yeop
    Park, Youngkeun
    Geum, Dae-Myoung
    Kim, Younghyun
    Baek, Yongku
    Cho, Byung Jin
    Kim, Sanghyeon
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (01) : 393 - 399
  • [5] Back-End-of-Line Compatible Fully Depleted CMOS Inverters Employing Ge p-FETs and α-InGaZnO n-FETs
    Kang, Yuye
    Han, Kaizhen
    Kumar, Annie
    Wang, Chengkuan
    Sun, Chen
    Zhou, Zuopu
    Zhou, Jiuren
    Gong, Xiao
    IEEE ELECTRON DEVICE LETTERS, 2021, 42 (10) : 1488 - 1491
  • [6] Impact of Off-State Stress on SiGe-channel p-FETs in 22nm FDSOI under Large-Signal Operation
    Dang Khoa Huynh
    Quang Huy Le
    Lehmann, Steffen
    Zhao, Zhixing
    Bossu, Germain
    Arfaoui, Wafa
    Kaempfe, Thomas
    Rudolph, Matthias
    2023 18TH EUROPEAN MICROWAVE INTEGRATED CIRCUITS CONFERENCE, EUMIC, 2023, : 173 - 176
  • [7] N- and P-type Si/SiGe hetero FETs
    König, U
    8TH IEEE INTERNATIONAL SYMPOSIUM ON HIGH PERFORMANCE ELECTRON DEVICES FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS, 2000, : 1 - 7
  • [8] Analysis of the Relaxed Contacted-Poly-Pitch Effect on the RF Performance of Strained-SiGe-Channel p-FETs in 22nm FDSOI Technology
    Le, Quang Huy
    Huynh, Dang Khoa
    Lehmann, Steffen
    Zhao, Zhixing
    Kaempfe, Thomas
    Rudolph, Matthias
    2021 16TH EUROPEAN MICROWAVE INTEGRATED CIRCUITS CONFERENCE (EUMIC 2021), 2021, : 22 - 25
  • [9] Optimisation of a thin epitaxial Si layer as Ge passivation layer to demonstrate deep sub-micron n- and p-FETs on Ge-On-insulator substrates
    De Jaeger, B
    Bonzom, R
    Leys, F
    Richard, O
    Van Steenbergen, J
    Winderickx, G
    Van Moorhem, E
    Raskin, G
    Letertre, F
    Billon, T
    Meuris, M
    Heyns, M
    MICROELECTRONIC ENGINEERING, 2005, 80 : 26 - 29
  • [10] DIRECT-WRITE N- AND P-TYPE GRAPHENE CHANNEL FETS
    Chang, Jiyoung
    Liu, Yumeng
    Kwang, Heo
    Lee, Byung Yang
    Lee, Seung-wuk
    Lin, Liwei
    26TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2013), 2013, : 201 - 204