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Low-frequency losses in silica glass at low temperature
被引:5
|作者:
Travasso, F.
[1
,2
]
Bosi, L.
[1
,2
]
Dari, A.
[1
,2
]
Gammaitoni, L.
[1
,2
]
Vocca, H.
[1
,2
]
Marchesoni, F.
[2
,3
]
机构:
[1] Univ Perugia, Dipartimento Fis, I-06123 Perugia, Italy
[2] VIRGO Project, Sez Perugia, Ist Nazl Fis Nucl, I-06123 Perugia, Italy
[3] Univ Camerino, Dipartimento Fis, I-62032 Camerino, Italy
来源:
关键词:
Internal friction;
Silica glass;
Glass relaxation;
Asymmetric double-well model;
INTERNAL-FRICTION;
STRUCTURAL RELAXATION;
ELASTIC PROPERTIES;
RAMAN-SCATTERING;
D O I:
10.1016/j.msea.2008.09.097
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Precise low-frequency internal friction measurements on vitreous silica, taken over a wide temperature (4 K < T < 300 K) and frequency range (40 Hz < nu < 14 kHz), show remarkable similarities, but also suggestive differences with recent light-scattering experiments. In the interval 30 K < T < 110 K, the exponent alpha(T) of the power-law relaxational spectrum at low frequencies turns out to be proportional to T - T-k, with a minimum at around T-k = 13 K. This phenomenon is interpreted as a manifestation of quenched spatial disorder. (C) 2009 Elsevier B.V. All rights reserved.
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页码:268 / 271
页数:4
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