Investigation of Scaling and Temperature Effects in Total Ionizing Dose (TID) Experiments in 65 nm CMOS

被引:0
|
作者
Chevas, Loukas [1 ]
Nikolaou, Aristeidis [1 ]
Bucher, Matthias [1 ]
Makris, Nikolaos [1 ]
Papadopoulou, Alexia [1 ]
Zografos, Apostolos [1 ]
Borghello, Giulio [2 ,4 ]
Koch, Henri D. [3 ,4 ]
Faccio, Federico [4 ]
机构
[1] Tech Univ Crete, Sch Elect & Comp Engn, Khania 73100, Greece
[2] Univ Udine, DPIA, I-33100 Udine, Italy
[3] Univ Mons, SEMi, B-7000 Mons, Belgium
[4] CERN, EP Dept, CH-1211 Geneva, Switzerland
关键词
Analog parameter; High Luminosity-Large Hadron Collider; ionizing radiation; MOSFET; total ionizing dose (TID);
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ten-fold radiation levels are expected in the upgrade of the High-Luminosity Large Hadron Collider (HL-LHC) at CERN. Bulk silicon CMOS at 65 nm offers appreciable advantages among cost, performance, and resilience to high 'total Ionizing Dose (TID). In the present paper, geometrical scaling of key analog design parameters of MOS transistors irradiated at high TID is investigated. Experiments are carried out for TM of 100, 200 and up to 500 Mrad(SiO2) and at -30 degrees C, 0 degrees C, and 25 degrees C. We find that parameters are least degraded at -30 degrees C However, short-channel NMOSTs show a significant degradation of slope factor, which is more severe at 0 degrees C than at 25 degrees C. In contrast, the slope factor in short-channel PMOSTs shows lowest sensitivity to high TID.
引用
收藏
页码:313 / 318
页数:6
相关论文
共 50 条
  • [41] Analysis of bias effects on the total ionizing dose response in a 180 nm technology
    Liu, Zhangli
    Hu, Zhiyuan
    Zhang, Zhengxuan
    Shao, Hua
    Chen, Ming
    Bi, Dawei
    Ning, Bingxu
    Zou, Shichang
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2011, 644 (01): : 48 - 54
  • [42] Total Ionizing Dose Hardness Enhancement at Room Temperature in CMOS 0.25μm Technology
    Cussac, G.
    Artola, L.
    Nuns, T.
    Ducret, S.
    2020 20TH EUROPEAN CONFERENCE ON RADIATION AND ITS EFFECTS ON COMPONENTS AND SYSTEMS (RADECS 2020), 2022, : 6 - 13
  • [43] Improvement of the tolerance to Total Ionizing Dose in SOI CMOS
    Domae, Y.
    Komatsubara, H.
    Shindou, H.
    Makihara, A.
    Kuboyama, S.
    Ida, J.
    2008 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, 2008, : 135 - +
  • [44] Total Ionizing Dose Effects on Analog Performance of 28 nm Bulk MOSFETs
    Zhang, C. -M.
    Jazaeri, F.
    Pezzotta, A.
    Bruschini, C.
    Borghello, G.
    Mattiazzo, S.
    Baschirotto, A.
    Enz, C.
    2017 47TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE (ESSDERC), 2017, : 30 - 33
  • [45] Layout dependence of total-ionizing-dose response in 65-nm bulk Si pMOSFET
    Ren, Zhexuan
    An, Xia
    Li, Gensong
    Zhang, Xing
    Huang, Ru
    SCIENCE CHINA-INFORMATION SCIENCES, 2021, 64 (02)
  • [46] Impact of Total Ionizing Dose on the Data Retention of a 65 nm SONOS-Based NOR Flash
    Puchner, H.
    Ruths, P.
    Prabhakar, V.
    Kouznetsov, I.
    Geha, S.
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2014, 61 (06) : 3005 - 3009
  • [47] Layout dependence of total-ionizing-dose response in 65-nm bulk Si pMOSFET
    Zhexuan REN
    Xia AN
    Gensong LI
    Xing ZHANG
    Ru HUANG
    ScienceChina(InformationSciences), 2021, 64 (02) : 271 - 272
  • [48] Layout dependence of total-ionizing-dose response in 65-nm bulk Si pMOSFET
    Zhexuan Ren
    Xia An
    Gensong Li
    Xing Zhang
    Ru Huang
    Science China Information Sciences, 2021, 64
  • [49] A Quantitative Approach to Characterize Total Ionizing Dose Effect of Periphery Device for 65 nm Flash Memory
    Jiang, Dandan
    Jin, Lei
    Huo, Zongliang
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2018, 10 (03) : 378 - 382
  • [50] TOTAL IONIZING DOSE EFFECT INVESTIGATED BY IN-SITU MEASUREMENTS FOR A 65nm FLASH TECHNOLOGY
    Jin, Lei
    Huo, Zongliang
    Jiang, Dandan
    Li, Xinkai
    Yao, Zhihong
    Yu, Zhaoan
    Liu, Ming
    2014 12TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT), 2014,