Direct double ionization of the Ar+ M shell by a single photon

被引:4
|
作者
Mueller, A. [1 ]
Kilcoyne, A. L. D. [2 ]
Phaneuf, R. A. [3 ]
Holste, K. [4 ]
Schippers, S. [4 ]
Kheifets, A. S. [5 ]
机构
[1] Justus Liebig Univ Giessen, Inst Atom & Mol Phys, D-35392 Giessen, Germany
[2] Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA
[3] Univ Nevada, Dept Phys, Reno, NV 89557 USA
[4] Justus Liebig Univ Giessen, Phys Inst 1, D-35392 Giessen, Germany
[5] Australian Natl Univ, Res Sch Phys, Canberra, ACT 2600, Australia
关键词
DOUBLE PHOTOIONIZATION; MULTIPLE PHOTOIONIZATION; CROSS-SECTIONS; ATOMS; MOLECULES; ELECTRONS; HELIUM; IONS;
D O I
10.1103/PhysRevA.103.L031101
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Direct double ionization of the Ar+(3p(-1)) ion by a single photon is investigated both experimentally and theoretically. The photon-ion merged-beams technique was employed at the Advanced Light Source in Berkeley, USA, to measure absolute cross sections in the energy range from 60 to 150 eV. In this range, three contributions to the double ionization of Ar+ are to be expected: the removal of two 3p electrons, of a 3s and a 3p electron, and of two 3s electrons. Among the possible mechanisms leading to double ionization, the TS1 (two-step one) process dominates in the near-threshold region. In TS1, a photoelectron is ejected and, on its way out, knocks out a secondary electron. This two-step mechanism is treated theoretically by multiplying the calculated cross section for direct single photoionization of a given subshell with the calculated (e, 2e) ionization probability for the ejected photoelectron to knock off a secondary electron. The calculated cross section is in very good agreement with the experiment.
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页数:5
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