Reliable contacts to two-dimensional conduction layers

被引:0
|
作者
Souw, V [1 ]
Li, S
McElfresh, M
Duan, Z
McInturff, D
Yulius, A
Chen, EH
Woodall, JM
机构
[1] Purdue Univ, Dept Phys, W Lafayette, IN 47907 USA
[2] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[3] Yale Univ, Dept Elect Engn, New Haven, CT 06520 USA
关键词
D O I
10.1063/1.126615
中图分类号
O59 [应用物理学];
学科分类号
摘要
For many experiments and device applications, electrical contacts to a two-dimensional conduction layer must remain reliable under repeated temperature cycling between 300 and 77 K or lower. This work introduces the use of a silicon-doped InAs contact to the AlGaAs/GaAs two-dimensional electron gas which demonstrates exceptional reliability under such temperature cycling. The noise spectrum of AlGaAs/GaAs contacted with silicon-doped InAs shows almost no dependence on bias current; this fact can be used to improve the performance of device applications such as Hall sensors. In addition, this work introduces an alternative two-dimensional conduction structure, highly mismatched InAs/GaP. InAs/GaP contacted with Ti/Au shows reliability equal to AlGaAs/GaAs contacted with silicon-doped InAs. The InAs/GaP material may be more desirable for some applications because of the lower temperature dependence of its electronic properties and potentially easier integration with silicon-based microelectronics. (C) 2000 American Institute of Physics. [S0003-6951(00)04822-1].
引用
收藏
页码:3307 / 3309
页数:3
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