Micropatterning BiFeO3 Thin Films on Self-assembled Monolayers

Different kinds of micro-patterns were fabricated within octadecyltrichlorosilane (OTS) self-assembled monolayers(SAMs) utilizing UV lithography. The BiFeO3 pattern films have been formed on silanol SAMs by the chemical solution deposition(CSD). The crystal phase composition, microstructure and topography of the as-prepared films were characterized by contact angle tester, X-ray diffraction(XRD), scanning electron microscopy(SEM) and energy disperse spectroscopy (EDS). The large contrast between octadecyl regions and silanol regions suggests selective deposition of BiFeO3 film on the silanol regions with deposited line width of 10 similar to 20 mu m.