A study of RHEED pattern from the epitaxial growth of Si-Ge crystal

被引:2
|
作者
Zhang Chong [1 ]
Ye Hui [1 ]
Zhang Lei [1 ]
Huang-Fu You-Rui [1 ]
Liu Xu [1 ]
机构
[1] Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China
关键词
Si-Ge epitaxial growth; RHEED; surface reconstruction; transmission pattern; ENERGY ELECTRON-DIFFRACTION; TWINNING-SUPERLATTICE;
D O I
10.7498/aps.58.7765
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The patterns of Reflection high energy electron diffraction (RHEED) from the epitaxial growth of Si-Ge crystal are interpreted basing on the kinetical diffraction theory of crystal. The transmission pattern is studied and interpreted, which relates to the rough surface after crystal growth. The RHEED patterns of polycrystalline rings and twin crystal and their evolvements are analyzed with respec to the epitaxial growth conditions.
引用
收藏
页码:7765 / 7772
页数:8
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