Planarization of natural single crystal diamond polishing lines by microwave hydrogen plasma

被引：2
|
作者：
Gaisinskaya, A. [1 ]
Edrei, R. [1 ]
Hoffman, A. [1 ]
Feldheim, Y.
机构：
[1] Technion Israel Inst Technol, Schulich Dept Chem, IL-32000 Haifa, Israel
来源：
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2009年 / 206卷 / 09期
关键词：
SURFACE; MICROSCOPY;
D O I：
10.1002/pssa.200982213
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effect of microwave hydrogenated (MW-H) plasma exposure on the morphology of mechanically polished natural single crystal (100) oriented diamond type 2a surfaces is reported. It is shown that the surface morphology is very sensitive to plasma power and exposure time. Under appropriate plasma exposure conditions the diamond surfaces smooth out as reflected in the decrease in the number and depth of the polishing lines. A systematic study of the influence of hydrogen MW plasma power and exposure time on the diamond surface morphology is presented. The morphology of the diamond surfaces at the different stages was monitored with sub-nanometric resolution by atomic force microscopy and scanning electron spectroscopy. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码：1960 / 1966
页数：7
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