Influence of Thermal Annealings in Argon on the Structural and Thermochromic Properties of MoO3 Thin Films

被引：0

作者：

Arvizu, M. A. ^{[1
,2
]}

Morales-Luna, M. ^{[3
]}

Perez-Gonzalez, M. ^{[1
]}

Campos-Gonzalez, E. ^{[4
]}

Zelaya-Angel, O. ^{[1
]}

Tomas, S. A. ^{[1
]}

机构：

[1] Ctr Invest & Estudios Avanzados IPN, Dept Fis, AP 14740, Mexico City 07360, DF, Mexico

[2] Uppsala Univ, Dept Engn Sci, Angstrom Lab, POB 534, S-75121 Uppsala, Sweden

[3] Ctr Invest & Estudios Avanzados IPN, Programa Nanociencias & Nanotecnol, AP 14740, Mexico City 07360, DF, Mexico

[4] Univ Autonoma Queretaro, Fac Quim Mat, Queretaro, Mexico

来源：

INTERNATIONAL JOURNAL OF THERMOPHYSICS | 2017年 / 38卷 / 04期

关键词：

Color centers; Magneli phases; Molybdenum oxide; Thermochromism; Thin films; Vapor deposition; MOLYBDENUM; OXIDE; WO3;

D O I：

10.1007/s10765-017-2190-1

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The effect of thermal annealing in an inert atmosphere (argon) on the structural and thermochromic properties of MoO3 thin films was investigated. MoO3 thin films were deposited by thermal evaporation in vacuum of MoO3 powders. X-ray diffraction patterns of the films showed the presence of the monoclinic Magneli phase Mo9O26 for annealing temperatures above 250 degrees C. Absorbance spectra of the films annealed in argon indicated that their thermochromic response increases with the annealing temperature in the analyzed range (23 degrees C-300 degrees C), a result opposite to the case of thermal annealings in air, for which case the thermochromic response shows a maximum value around 200 degrees C-225 degrees C and decreases for higher temperatures. These results are explained in terms of a higher density of oxygen vacancies formed upon thermal treatments in inert atmospheres.

引用

页数：9

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