Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

This presentation reported an approach of glucose derivatives to resist polymers for eco-friendly optical NEMS and MEMS. The material design concept to use the water-soluble resist material with highly efficient crosslinking, water development, and lower film thickness shrinkage was proposed for green lithography. The lithographic properties due to the glucose derivatives, and the low film thickness shrinkage due to distinctive bulky chemical structure were proposed in the resist material, and then demonstrated to be effective for creating high resolution, excellent patterning dimensional accuracy, and low line edge roughness in EB lithography. Mixing or blending of glucose and cellulose derivatives was a valuable approach to the design of resist formulations for eco-friendly optical NEMS and MEMS.