Investigation of H- production in plasma of dc glow discharge

被引:4
|
作者
Belostotsky, S. G. [1 ]
Lopaev, D. V. [1 ]
Rakhimova, T. V. [1 ]
机构
[1] Moscow MV Lomonosov State Univ, Skobeltsyn Nucl Phys Inst, Moscow 119992, Russia
关键词
D O I
10.1088/1742-6596/44/1/022
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The laser photodetachment technique was applied to investigate the negative ion dynamics in the positive column of a pure hydrogen dc glow discharge at pressures P = 0.1 - 3 Torr. Upon the discharge current modulation, the negative ion H- concentration decayed with the characteristic loss time of hydrogen H (1s(2)S) atom concentration. The evolution of H atom concentration was investigated by the time-resolved actinometry. The axial electric field was measured by double probe technique. The analysis of the experimental data, i.e. the dependencies of H- and H concentrations as well as reduced electric field on the discharge parameters (discharge current and pressure), allowed us to determine the rate constant of H- production in the discharge, where vibrational excitation and reactions with atoms H greatly influence upon H- production and loss processes. The main processes, which contribute to H- production, are discussed in detail. The vibrational excitation of H, is shown to increase the rate of dissociative attachment essentially not only via the excitation of the well-known low-threshold (epsilon(th)approximate to 3 eV) resonance of H-2(-)(X-2 Sigma u(+)), but also via the excitation of the high-threshold resonances of H-2(-)((2)Sigma(+)(g)(epsilon(th)approximate to 6 eV), (2)Pi(g), (2)Pi(u)(epsilon(th)approximate to 8-13 eV) etc). Detailed analysis of dissociative attachment via high-threshold resonances allowed us to describe experimental data in the whole range of E/N being investigated, whereas taking any other mechanisms into account (attachment to Rydberg states of H-2 etc) failed to do that.
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页码:162 / +
页数:2
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