Characteristics of Carbon Films Deposited by Magnetron Sputtering

被引:0
|
作者
Mroz, W. [1 ]
Burdynska, S. [1 ]
Prokopiuk, A. [1 ]
Jedynski, M. [1 ]
Budner, B. [1 ]
Korwin-Pawlowski, M. L. [2 ]
机构
[1] Mil Univ Technol, Inst Optoelect, PL-00908 Warsaw, Poland
[2] Univ Quebec Outaouais, Dept Informat & Ingn, Gatineau, PQ J8X 3X7, Canada
关键词
DIAMOND-LIKE CARBON; NITRIDE FILMS; PLASMA; NITROGEN;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Carbon thin films are often called in the literature, "diamond-like carbon" films. They consist of two basic allotropic forms of carbon, which are graphite and diamond. Carbon atoms with sp(2) bonds form after deposition of a graphite-like phase. Atoms with sp(3) bonds form a diamond-like phase. Diamond-like crystallites are built into a graphite-like phase matrix. In this paper there are presented experimental results of deposition of carbon films by the magnetron sputtering method and the results of analysis of the surface and phase structures of the deposited films. The amorphous carbon films were deposited from graphite targets on 316L steel substrates. The films were deposited at room temperature, in vacuum. The deposition time was 3 h; the depositions were conducted at two different distances between the substrate and the magnetron target.
引用
收藏
页码:S120 / S122
页数:3
相关论文
共 50 条
  • [1] Growth characteristics of tungsten-carbon films deposited by magnetron sputtering
    Harry, E
    Pauleau, Y
    Adamik, M
    Barna, PB
    Sulyok, A
    Menyhard, M
    [J]. SURFACE & COATINGS TECHNOLOGY, 1998, 100 (1-3): : 291 - 294
  • [2] Properties of carbon nitride films deposited by magnetron sputtering
    Kusano, Y
    Evetts, JE
    Somekh, RE
    Hutchings, IM
    [J]. THIN SOLID FILMS, 1998, 332 (1-2) : 56 - 61
  • [3] Characteristics of triode magnetron sputtering: the morphology of deposited titanium films
    Fontana, LC
    Muzart, JLR
    [J]. SURFACE & COATINGS TECHNOLOGY, 1998, 107 (01): : 24 - 30
  • [4] Characteristics of (TiAlCrNbY)C films deposited by reactive magnetron sputtering
    Braic, M.
    Braic, V.
    Balaceanu, M.
    Zoita, C. N.
    Vladescu, A.
    Grigore, E.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2010, 204 (12-13): : 2010 - 2014
  • [5] Structure and properties of carbon nitride films deposited by magnetron sputtering
    Zheng, WT
    Ji, H
    Yu, WX
    Li, HB
    Jin, ZS
    Wang, YM
    Sundgren, JE
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 1999, 60 (02) : 163 - 167
  • [6] Amorphous carbon films rich in diamond deposited by magnetron sputtering
    Logothetidis, S
    Gioti, M
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 46 (1-3): : 119 - 123
  • [7] Characteristics of Mo Thin Films Deposited by DC Magnetron Sputtering
    Kong, Seon Mi
    Xiao, Yubin
    Kim, Eun Ho
    Chung, Chee Won
    [J]. KOREAN CHEMICAL ENGINEERING RESEARCH, 2011, 49 (02): : 195 - 199
  • [8] Effect of the substrate temperature on the physical characteristics of amorphous carbon films deposited by dc magnetron sputtering
    Mounier, E
    Bertin, F
    Adamik, M
    Pauleau, Y
    Barna, PB
    [J]. DIAMOND AND RELATED MATERIALS, 1996, 5 (12) : 1509 - 1515
  • [9] Optical properties of amorphous carbon films deposited by magnetron sputtering of graphite
    Ivanov-Omskii, VI
    Tolmatchev, AV
    Yastrebov, SG
    [J]. SEMICONDUCTORS, 2001, 35 (02) : 220 - 225
  • [10] Properties of Nanocomposite Nickel-Carbon Films Deposited by Magnetron Sputtering
    A. S. Grenadyorov
    K. V. Oskomov
    A. A. Solov’ev
    S. V. Rabotkin
    A. N. Zakharov
    V. A. Semenov
    V. O. Oskirko
    Yu. I. Yelgin
    O. S. Korneva
    [J]. Russian Physics Journal, 2017, 60 : 1285 - 1290