Optimization of ohmic contact on n-type GaAs by screen-printing silver paste

被引:3
|
作者
Sun, Qiangjian [1 ,2 ]
Long, Junhua [2 ]
Dai, Pan [3 ]
Huang, Xinping [2 ]
Nie, Shuhong [4 ]
Su, Wenming [4 ]
Wu, Dongying [2 ]
Li, Xuefei [2 ]
Lu, Jianya [2 ]
Xing, Zhiwei [2 ]
Yang, Wenxian [2 ]
Lu, Shulong [2 ]
机构
[1] Univ Sci & Technol China, Nano Sci & Technol Inst, Hefei 230026, Peoples R China
[2] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Suzhou 215123, Peoples R China
[3] Huzhou Univ, Sch Informat Engn, Huzhou 313000, Peoples R China
[4] Chinese Acad Sci, Printable Elect Res Ctr, Suzhou Inst Nanotech & Nanobion, Suzhou 215123, Peoples R China
基金
中国国家自然科学基金;
关键词
silver paste; SP; GaAs; ohmic contact; specific contact resistance; SOLAR-CELLS; JUNCTION;
D O I
10.35848/1347-4065/aba7d8
中图分类号
O59 [应用物理学];
学科分类号
摘要
We used printed electronics technology to print silver paste (SP) on n-GaAs as an electrode replacing conventional alloy electrodes to simplify the fabrication process of solar cell and to reduce cost. The linear transmission line model was used to characterize the performances of SP/semiconductor ohmic contact at different annealing temperatures. The lowest specific contact resistance between SP and n-GaAs of 1.8 x 10(-4) omega cm(2)was achieved after annealing at 560 degrees C, which indicates the appropriate annealing temperature can not only ensure the close contact of silver particles, but also reduce the barrier height of metals and semiconductors to a certain extent. On the basis of these results, n-GaAs with an SP electrode can be promisingly applied to realize highly efficient and simple-manufacturing III-V solar cells.
引用
收藏
页数:6
相关论文
共 50 条
  • [41] MICROSTRUCTURE STUDIES OF AUNIGE OHMIC CONTACTS TO N-TYPE GAAS
    MURAKAMI, M
    CHILDS, KD
    BAKER, JM
    CALLEGARI, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (04): : 903 - 911
  • [42] AU-GE/IN OHMIC CONTACTS TO N-TYPE GAAS
    BARNARD, WO
    WILLIS, AJ
    THIN SOLID FILMS, 1988, 165 (01) : 77 - 82
  • [43] Microstructural analysis of NiInGe ohmic contacts for n-type GaAs
    Tsunoda, Y
    Murakami, M
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (01) : 76 - 81
  • [44] THERMALLY STABLE NONGOLD OHMIC CONTACTS TO N-TYPE GAAS .1. NIGE CONTACT METAL
    TANAHASHI, K
    TAKATA, HJ
    OTUKI, A
    MURAKAMI, M
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) : 4183 - 4190
  • [45] THERMALLY STABLE OHMIC CONTACTS TO N-TYPE GAAS .3. GELNW AND NILNW CONTACT METALS
    MURAKAMI, M
    SHIH, YC
    PRICE, WH
    WILKIE, EL
    CHILDS, KD
    PARKS, CC
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (04) : 1974 - 1982
  • [46] EFFECTS OF INTERFACIAL MICROSTRUCTURE ON UNIFORMITY AND THERMAL-STABILITY OF AUNIGE OHMIC CONTACT TO N-TYPE GAAS
    SHIH, YC
    MURAKAMI, M
    WILKIE, EL
    CALLEGARI, AC
    JOURNAL OF APPLIED PHYSICS, 1987, 62 (02) : 582 - 590
  • [47] THERMALLY STABLE NONGOLD OHMIC CONTACTS TO N-TYPE GAAS .2. NISIW CONTACT METAL
    TAKATA, HJ
    TANAHASHI, K
    OTSUKI, A
    INUI, H
    MURAKAMI, M
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) : 4191 - 4196
  • [48] Ohmic contact formation for n-type diamond by selective doping
    Teraji, Tokuyuki
    Katagiri, Masayuki
    Koizumi, Satoshi
    Ito, Toshimichi
    Kanda, Hisao
    Japanese Journal of Applied Physics, Part 2: Letters, 2003, 42 (8 A):
  • [49] Ohmic Contact to n-Type Ge With Compositional W Nitride
    Wu, Huan Da
    Wang, Chen
    Wei, Jiang Bin
    Huang, Wei
    Li, Cheng
    Lai, Hong Kai
    Li, Jun
    Liu, Chunli
    Chen, Song Yan
    IEEE ELECTRON DEVICE LETTERS, 2014, 35 (12) : 1188 - 1190
  • [50] Ohmic contact to n-type Ge with compositional Ti nitride
    Wu, H. D.
    Huang, W.
    Lu, W. F.
    Tang, R. F.
    Li, C.
    Lai, H. K.
    Chen, S. Y.
    Xue, C. L.
    APPLIED SURFACE SCIENCE, 2013, 284 : 877 - 880