X-ray interferometry technique using an X-ray microfocus laboratory source.

被引：0

作者：

Voevodina, M. ^{[1
]}

Lyatun, S. ^{[1
]}

Barannikov, A. ^{[1
]}

Lyatun, I ^{[1
]}

Snigireva, I ^{[2
]}

Snigirev, A. ^{[1
]}

机构：

[1] Immanuel Kant Baltic Fed Univ, Nevskogo 14, Kaliningrad 236016, Russia

[2] European Synchrotron Radiat Facil, 71 Ave Martyrs, F-38043 Grenoble, France

来源：

ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS IX | 2020年 / 11492卷

关键词：

X-ray interferometry; compound refractive lenses; reflecto-interferometry; spatial resolution; REFRACTIVE LENSES;

D O I：

10.1117/12.2568499

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-ray reflecto-interferometry technique based on compound refractive lenses using an X-ray laboratory source was proposed to study thin-film structures. The setup for this experiment is very simple: a focused X-ray beam is reflected from parallel flat surfaces, which creates an interference pattern in a wide angular range, therefore the interference pattern can be obtained in a single shot without the need to rotate the sample or the detector. The reflecto-interferograms for Si3N4 membranes were obtained using the MetalJet Excillium micro-focus laboratory source with GaK alpha emission line at 9.25 keV. The experimentally obtained film thickness is in good agreement with the declared characteristics.

引用

页数：6

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