Three-dimensional optical lithography for photonic microstructures

被引：61
|
作者：
Scrimgeour, Jan
Sharp, David N.
Blanford, Christopher F.
Roche, Olivia M.
Denning, Robert G.
Turberfield, Andrew J. [1 ]
机构：
[1] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England
[2] Univ Oxford, Inorgan Chem Lab, Dept Chem, Oxford OX1 3QR, England
来源：
ADVANCED MATERIALS | 2006年 / 18卷 / 12期
基金：
英国工程与自然科学研究理事会;
关键词：
D O I：
10.1002/adma.200502286
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Photonic-crystal devices must be precisely aligned within a photonic-crystal lattice. Rapid and flexible optical fabrication of a device embedded in, and in registration with, a 3D photonic crystal is demonstrated. Holographic lithography (see figure) is used to define the underlying periodic microstructure in a single exposure, and two-photon laser writing to create localized structural defects. An intermediate latent image of the photonic crystal is used to align the two exposures.
引用
收藏
页码：1557 / +
页数：5
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