Introduction: Special issue on radiation damage

被引：22
|
作者：
Howells, Malcolm R. [1 ]
Hitchcock, Adam P. [2 ]
Jacobsen, Chris J. [3 ]
机构：
[1] Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA USA
[2] McMaster Univ, Dept Chem, Hamilton, ON, Canada
[3] SUNY Stony Brook, Dept Phys & Astron, Stony Brook, NY 11794 USA
来源：
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2009年 / 170卷 / 1-3期
关键词：
X-RAY MICROSCOPY; MACROMOLECULAR CRYSTALS; BIOLOGICAL-MATERIALS; ELECTRON-MICROSCOPY; TRANSMISSION; LIMITATIONS; RESOLUTION;
D O I：
10.1016/j.elspec.2009.01.004
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
引用
收藏
页码：1 / 3
页数：3
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