Micromachined Coplanar Waveguide Band-Pass Filter for W-Band Applications

被引:0
|
作者
Neculoiu, Dan [1 ,2 ]
Bunea, Alina-Cristina [1 ,2 ]
机构
[1] IMT Bucharest, Bucharest, Romania
[2] Polytech Univ, Bucharest, Romania
关键词
band-pass filter; electromagnetic modeling; millimeter waves; silicon micromachining;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we present the design and measurements for a novel configuration of a membrane supported coplanar waveguide band-pass filter for W band applications. The topology is based on identical symmetrical elementary cells connected in cascade. The design process is based on the image impedance representation and a full-wave 3D electromagnetic (EM) model is developed. A two-cell test structure was fabricated through silicon micromachining. The measured pass-band is of 28 %, centered around 91.5 GHz. The measured losses are of 3.77 dB at the central frequency and the reflection losses go down to -20 dB, in good agreement with the simulated results. This structure was designed to be easily adapted to the BiCMOS technology with localized back-side etch (LBE) process.
引用
收藏
页码:1230 / 1233
页数:4
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