Conductivity type conversion in Hg1-xCdxTe

被引:34
|
作者
Shaw, D [1 ]
Capper, P
机构
[1] Univ Hull, Dept Phys, Hull HU6 7RX, N Humberside, England
[2] GEC Marconi Infra Red Ltd, Southampton SO15 0EG, Hants, England
关键词
D O I
10.1023/A:1008989701564
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Schaake model for the p to n-type conversion in Hg1-xCdxTe caused by annealing in Hg vapor has been extended to obtain an analytic expression for x(J)(2)/t in terms of basic defect parameters and the background donor concentration (x(J) is the p-n junction depth at time t). Fitting of the Schaake equation for the depth of the skin-core boundary to the results of Bogoboyaschii enables estimates to be obtained for the values of the defect parameters involved in Hg0.8Cd0.2Te. These values are compared with those from simulations using SUMerCad. Good agreement is found between the new analytic expression for x(J)(2)/t and the available experimental evidence. Type conversion caused by ion beam milling and anodized surfaces can also be described by the new expression if the concept of an effective Hg interstitial surface concentration is introduced.
引用
收藏
页码:169 / 177
页数:9
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