Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography

被引:9
|
作者
Jaramillo, Juan [1 ]
Zarzycki, Artur [2 ]
Galeano, July [3 ]
Sandoz, Patrick [4 ]
机构
[1] Univ EAFIT, Linea Microingn, Grp Invest Electromagnetismo Aplicado, Medellin 050022, Colombia
[2] ITM, Linea Sistemas Control & Robot, Grp Invest Automat Elect & Ciencias Computac, Medellin 050013, Colombia
[3] ITM, Linea Biomat & Electromed, Grp Invest Mat Avanzados & Energia MatyEr, Medellin 050013, Colombia
[4] Univ Bourgogne Franche Comte, UFC CNRS ENSMM UTBM, FEMTO ST Inst, Dept Appl Mech, Besancon 25000, France
关键词
laser direct writing; photolithography; microfabrication; G-Code; high-resolution positioning; xy-stage; FOURIER-TRANSFORM METHOD; FABRICATION; RESOLUTION; DESIGN;
D O I
10.3390/s17020278
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
This article concerns the characterization of the stability and performance of a motorized stage used in laser direct writing lithography. The system was built from commercial components and commanded by G-code. Measurements use a pseudo-periodic-pattern (PPP) observed by a camera and image processing is based on Fourier transform and phase measurement methods. The results report that the built system has a stability against vibrations determined by peak-valley deviations of 65 nm and 26 nm in the x and y directions, respectively, with a standard deviation of 10 nm in both directions. When the xy-stage is in movement, it works with a resolution of 0.36 mu m, which is an acceptable value for most of research and development (R and D) microtechnology developments in which the typical feature size used is in the micrometer range.
引用
收藏
页数:14
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