Effects of substrate temperature on the properties of the indium tin oxide thin films deposited by sputtering method

被引：2
|
作者：
Wu, Chia-Ching [1 ]
Diao, Chien-Chen [2 ]
机构：
[1] Natl Taitung Univ, Dept Appl Sci, Taitung, Taiwan
[2] Kao Yuan Univ, Dept Elect Engn, Kaohsiung, Taiwan
来源：
2018 3RD INTERNATIONAL CONFERENCE ON PRECISION MACHINERY AND MANUFACTURING TECHNOLOGY (ICPMMT 2018) | 2018年 / 185卷
关键词：
D O I：
10.1051/matecconf/201818500006
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
High-quality transparent conductive indium tin oxide (ITO) thin films were deposited on glass substrates using radio frequency sputtering method. The structure and electrical and optical properties of the ITO thin films were mainly investigated. The ITO thin films showed strong diffraction peak having a preferred orientation along the [111] direction as the deposition temperature at 120 to 160 degrees C. In the transmission spectra, the optical transmittance increased in the visible range as the deposition temperature increased from RT to 160 degrees C A minimum resistivity of 3.06x10(-3) O-cm was obtained for the ITO thin film deposition at 160 degrees C
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页数：6
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