Ion-beam induced current in high-resistance materials

被引:0
|
作者
Yukalov, VI
Yukalova, EP
机构
[1] Univ Sao Paulo, Inst Fis Sao Carlos, BR-13560970 Sao Paulo, Brazil
[2] Joint Inst Nucl Res, Bogolyubov Lab Theoret Phys, Dubna 141980, Russia
[3] Joint Inst Nucl Res, Dept Computat Phys, Lab Comp Tech & Automat, Dubna 141980, Russia
来源
关键词
D O I
10.1002/(SICI)1521-396X(200001)177:1<267::AID-PSSA267>3.0.CO;2-H
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The peculiarities of electric current in high-resistance materials, such as semiconductors or semimetals, irradiated by ion beams are considered. It is shown that after ion-beam irradiation an unusual electric current may arise directed against the applied voltage. Such a negative current is a transient effect appearing at the initial stage of the process. The possibility of using this effect for studying the characteristics of irradiated materials is discussed. A new method for defining the mean projected range of ions is suggested.
引用
收藏
页码:267 / 276
页数:10
相关论文
共 50 条
  • [1] Ion-beam induced current in high-resistance materials
    Yukalov, V.I., 2000, Wiley-VCH Verlag Berlin GmbH, Weinheim, Germany (177):
  • [2] High current and high intensity pulsed ion-beam sources for combined treatment of materials
    Ryabchikov, AI
    Petrov, AV
    Stepanov, IB
    Shulepov, IA
    Tolmachjeva, VG
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (02): : 783 - 785
  • [3] High current density ion-beam extraction
    Kondrashev, S
    Balabaev, A
    Zorin, V
    Sidorov, A
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2005, 160 (10-12): : 495 - 497
  • [4] FOCUSED ION-BEAM INDUCED DEPOSITION IN THE HIGH-CURRENT DENSITY REGION
    TAKAHASHI, Y
    MADOKORO, Y
    ISHITANI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3233 - 3237
  • [5] EXTRACTION AND TRANSPORT OF THE HIGH-CURRENT ION-BEAM
    CHUNG, KH
    CHOI, BH
    KIM, W
    KO, SK
    PROCEEDINGS OF THE 1989 IEEE PARTICLE ACCELERATOR CONFERENCE, VOLS 1-3: ACCELERATOR SCIENCE AND TECHNOLOGY, 1989, : 688 - 690
  • [6] Dynamics of a high-current electron beam in an ion-beam undulator
    Golub', Y. Y.
    Rozanov, N. E.
    Zhurnal Tekhnicheskoi Fiziki, 1995, 40 (04):
  • [8] HIGH-CURRENT ION-BEAM FROM A MOVING PLASMA
    DEMBINSKI, M
    JOHN, PK
    PONOMARENKO, AG
    APPLIED PHYSICS LETTERS, 1979, 34 (09) : 553 - 555
  • [9] FOCUSED ION-BEAM SYSTEM WITH HIGH-CURRENT DENSITY
    BISCHOFF, L
    HESSE, E
    JANSSEN, D
    NAEHRING, FK
    NOTZOLD, F
    SCHMIDT, G
    TEICHERT, J
    MICROELECTRONIC ENGINEERING, 1991, 13 (1-4) : 367 - 370
  • [10] Intense ion-beam treatment of materials
    Davis, HA
    Remnev, GE
    Stinnett, RW
    Yatsui, K
    MRS BULLETIN, 1996, 21 (08) : 58 - 62