Finite element simulation of residual stresses in epitaxial layers

被引:0
|
作者
Dluzewski, P
Jurczak, G
Maciejewski, G
Kret, S
Ruterana, P
Nouet, G
机构
[1] PAS, Full Inst Fundamental Technol Res, PL-00049 Warsaw, Poland
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[3] ISMRA Univ Caen, UMR 6508 CNRS, CRISMAT, ESCTM, F-14050 Caen, France
关键词
dislocations; anisotropic hyperelasticity; residual stresses;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A nonlinear finite element approach presented here is based on the constitutive equations for anisotropic hyperelastic materials. By digital image processing the elastic incompatibilities (lattice mismatch) are extracted from the HRTEM image of GaN epilayer. Such obtained tensorial field of dislocation distribution is used next as the input data to the FE code. This approach is developed to study the stress distribution associated with lattice defects in highly mismatched heterostructures applied as buffer layers for the optically active structures.
引用
收藏
页码:141 / 146
页数:6
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