Characterization of electroplated FeSe thin films

被引:52
|
作者
Thanikaikarasan, S. [1 ]
Mahalingam, T. [1 ]
Raja, M. [1 ]
Kim, Taekyu [2 ]
Kim, Yong Deak [3 ]
机构
[1] Alagappa Univ, Dept Phys, Karaikkudi 630003, Tamil Nadu, India
[2] Univ Arizona, Dept Elect & Comp Engn, Tucson, AZ 85721 USA
[3] Ajou Univ, Dept Elect & Comp Engn, Suwon 443749, South Korea
关键词
DEPOSITION; INJECTION;
D O I
10.1007/s10854-008-9794-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin films of iron selenide (FeSe) were electrodeposited on tin oxide coated conducting glass Substrates at various bath temperatures, deposition potential and solution pH values. The deposited filius were characterized by X-ray diffraction, energy dispersive X-ray analysis, scanning electron microscopy and optical absorption techniques, respectively. The structure was found to be hexagonal with preferential orientation along {002} plane. X-ray line profile analysis technique by the method of variance has been used to evaluate the microstructural parameters. The variation of microstructural parameters with bath temperature, deposition potential and solution pH values were studied. The observed results are discussed in detail.
引用
收藏
页码:727 / 734
页数:8
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