Light management of a-SiOx:H thin film solar cells with hydrogen-reduced p plus buffer at TiO2/p-layer interface

被引:3
|
作者
Kang, Dong-Won [1 ]
Chowdhury, Amartya [2 ]
Sichanugrist, Porponth [2 ]
Konagai, Makoto [2 ,3 ]
机构
[1] Cheongju Univ, Dept Solar & Energy Engn, Cheongju 363764, South Korea
[2] Tokyo Inst Technol, Dept Phys Elect, Tokyo 1528552, Japan
[3] Tokyo City Univ, Adv Res Lab, Setagaya Ku, Tokyo 1580082, Japan
关键词
Solar cell; Anti-reflection; Back reflection; Silicon oxide; H-2-reduced buffer; OXIDE; EFFICIENCY; JUNCTION; TRIPLE; PERFORMANCE; ZNO;
D O I
10.1016/j.solmat.2015.07.016
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In this study, light-management approaches for amorphous silicon oxide (a-SiOx:H) thin film solar cells were developed. First, to enhance back reflection in the device, an Al-doped ZnO (AZO) film was introduced at the back interface between n-type nanocrystalline silicon oxide (n-nc-SiOx:H) and Ag. In addition, we successfully suppressed optical losses at front interfaces by employing anti-reflection layers of MgF2 at air/Asahi-VU and TiO2 at Asahi-VU/p-layer interfaces. These light-managing techniques contributed to the enhancing of the short circuit current density (J(SC)) from 9.88 to 11.42 mA/cm(2), resulting in an increase in efficiency from 735% to 8.15%. We next replaced AZO/p-nc-SiOx:H conventional buffer layers inserted at the TiO2/p-layer interface by developing a hydrogen-reduced p+ buffer layer to remove the AZO protection layer. The new TiO2/buffer structure was found to be beneficial for attaining a good fill factor (0.738) and open circuit voltage (1.013 V) by avoiding hydrogen plasma damages; this, improved the efficiency of the a-SiOx:H solar cell up to 8.40% when using a very thin absorber of only 100 nm. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:296 / 301
页数:6
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