In-Situ Raman Spectroscopy Study of Photoinduced Structural Changes in Ge-rich Chalcogenide Films

被引:10
|
作者
Zhang, Ran [1 ,2 ]
Ren, Jing [1 ]
Jain, Himanshu [2 ]
Liu, Yinyao [1 ]
Xing, Zhongwen [3 ]
Chen, Guorong [1 ]
机构
[1] E China Univ Sci & Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Ultrafine Mat, Shanghai 200237, Peoples R China
[2] Lehigh Univ, Dept Mat Sci & Engn, Bethlehem, PA 18015 USA
[3] Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210093, Jiangsu, Peoples R China
基金
中国国家自然科学基金; 美国国家科学基金会;
关键词
SE GLASSES; THIN-FILMS; SEPARATION; RIGIDITY;
D O I
10.1111/jace.12879
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Very few studies have been directed at the compositional dependence of the intrinsic photostability of the GexSe1-x binary ChG films especially for the Ge-rich films with the mean coordination number (MCN) larger than 2.67. Here, by measuring the in-situ transmission changes, it shows that the photosensitivity (e.g., photobleaching, PB) of the Ge-rich films (as compared to the GeSe2 film) is attenuated, in fact almost completely eliminated in the film with the largest MCN. A straightforward technique, in-situ Raman spectroscopy, is used to record the time-resolved intrinsic structural changes during the irradiation of the films. The result indicates a transition from PB towards photostability occurs at the critical composition of GeSe2 corresponding to the structural phase transition. The stressed rigid structures of the Ge-rich films inhibit any significant photo-structural changes.
引用
收藏
页码:1421 / 1424
页数:4
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