Vapor growth and characterization of Cr-doped ZnSe crystals

被引:42
|
作者
Su, CH
Feth, S
Volz, MP
Matyi, R
George, MA
Chattopadhyay, K
Burger, A
Lehoczky, SL
机构
[1] NASA, George C Marshall Space Flight Ctr, Micrograv Sci & Applicat Dept, Sci Directorate, Huntsville, AL 35812 USA
[2] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
[3] Univ Alabama, Dept Chem, Ctr Mat & Surface Sci, Huntsville, AL 35899 USA
[4] Fisk Univ, Dept Phys, NASA, Fisk Ctr Photon Mat & Devices, Nashville, TN 37208 USA
基金
美国国家航空航天局;
关键词
Cr-doped ZnSe crystals; vapor growth; HRTXD; AFM;
D O I
10.1016/S0022-0248(99)00358-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Cr-doped ZnSe single crystals were grown by a self-seeded physical vapor transport technique in both vertical (stabilized) and horizontal configurations. The source materials were mixtures of ZnSe and CrSe. Growth temperatures were in the range of 1140-1150 degrees C and the furnace translation rates were 1.9-2.2 mm/day. The surface morphology of the as-grown crystals was examined by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Different features of the as-grown surface of the vertically and horizontally grown crystals suggest that different growth mechanisms were involved in the two growth configurations. The [Cr] doping levels were determined to be in the range of 1.8-8.3 x 10(19) cm(-3) from optical absorption measurements. The crystalline quality of the grown crystals were examined by high-resolution triple-crystal X-ray diffraction (HRTXD) analysis. (C) 1999 Published by Elsevier Science B.V.
引用
收藏
页码:35 / 42
页数:8
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