Is there light at the end of the road for optical lithography? As optical lithography nears its physical limits, the 2001 ITRS update to the lithography roadmap presents possible next-generation lithography technologies

被引：0
|
作者：
Levinson, HJ [1 ]
机构：
[1] Strateg Lithog Technol, Sunnyvale, CA 94088 USA
来源：
IEEE CIRCUITS & DEVICES | 2002年 / 18卷 / 04期
关键词：
D O I：
10.1109/MCD.2002.1021122
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：50 / 58
页数：9
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