To-and-fro motion of W5Si3 a β-Si3N4 substrate at elevated temperatures

被引：0
|
作者：
Arai, S
Suzuki, K
Saka, H [1 ]
机构：
[1] Nagoya Univ, Dept Quantum Engn, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Dept Mat Sci & Engn, Nagoya, Aichi 4648603, Japan
[3] Nagoya Univ, Ctr Integrated Res Sci & Technol, Nagoya, Aichi 4648603, Japan
来源：
MICROSCOPY AND MICROANALYSIS | 2002年 / 8卷 / 01期
关键词：
fine particles; to-and-fro motion; in situ heating experiment; W5Si3; beta-Si3N4;
D O I：
10.1017/S1431927602010048
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Behavior of fine crystalline particles of W5Si3 on a beta-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.
引用
收藏
页码：16 / 20
页数：5
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