Plasmonic Terahertz Waveguide Based on Anisotropically Etched Silicon Substrate

被引:11
|
作者
Li, Shanshan [1 ]
Jadidi, Mohammad M. [1 ]
Murphy, Thomas E. [1 ,2 ]
Kumar, Gagan [2 ]
机构
[1] Univ Maryland, Dept Elect & Comp Engn, College Pk, MD 20742 USA
[2] Univ Maryland, Inst Res Elect & Appl Phys, College Pk, MD 20742 USA
关键词
Anisotropic etching; plasmonics; subwavelength structures; SURFACES; METAMATERIAL; PROPAGATION; POLARITONS; WIRES;
D O I
10.1109/TTHZ.2014.2325739
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We experimentally examine anisotropically etched silicon surfaces for terahertz (THz) plasmonic guided wave applications. Highly doped silicon surfaces are anisotropically etched to form a one-dimensional array of subwavelength concave pyramidal troughs. The plasmonic waveguides are found to support highly confined guided modes both in transverse and longitudinal directions. The resonant frequencies of the modes can be controlled by adjusting the geometrical parameters of the troughs. The existence of guided modes in plasmonic waveguides is also established through finite-element-based numerical simulations. These waveguides could provide a silicon-based alternative to metallic waveguides for use in future THz devices.
引用
收藏
页码:454 / 458
页数:5
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