X-Ray Residual Stress Gradient Analysis in Annealed Silver Thin Films Using Asymmetric Bragg Diffraction

被引:8
|
作者
Njeh, Anouar [1 ]
Schneider, Dieter [2 ]
Fuess, Hartmut [3 ]
Ghozlen, Mohamed Hedi Ben [1 ]
机构
[1] Sfax Univ, Fac Sci, Phys Mat Lab, Sfax 3018, Tunisia
[2] Fraunhofer Inst Mat & Strahltechnol, D-01277 Dresden, Germany
[3] Tech Univ Darmstadt, Inst Mat Sci, D-64287 Darmstadt, Germany
关键词
Residual Stress Gradient; Thin Films; X-Ray Scattering; Surface Acoustic Wave; Grazing Incidence Diffraction; GRAZING-INCIDENCE DIFFRACTION; DEPENDENCE;
D O I
10.1515/zna-2009-1-216
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Residual stresses were determined in magnetron-sputtered Ag thin films of 400 nm thickness by asymmetric Bragg scattering. The corresponding cos(2 alpha)sin(2) psi plots were nonlinear which indicates a strong residual gradient along the depth of the samples. The in-plane stress was highly compressive at the sample surface and became tensile at the interface. The out-plane stress was compressive and reached its maximum at the sample interface. The stress gradient changed significantly with post-annealing temperature. A Young's modulus of E = 83 GPa and a Poisson ratio of v = 0.3 were measured by surface acoustic wave dispersion.
引用
收藏
页码:112 / 122
页数:11
相关论文
共 50 条
  • [1] Analysis of residual stress in polycrystalline silver thin films by x-ray diffraction
    Alford, TL
    Zeng, YI
    Zou, YL
    Deng, F
    Lau, SS
    Laursen, T
    Ullrich, BM
    POLYCRYSTALLINE THIN FILMS - STRUCTURE, TEXTURE, PROPERTIES AND APPLICATIONS III, 1997, 472 : 293 - 298
  • [2] Evaluation of residual stress in thin ferroelectric films using grazing incident X-ray diffraction
    Petrov, PK
    Sarma, K
    Alford, NM
    INTEGRATED FERROELECTRICS, 2004, 63 : 183 - 189
  • [3] Texture evolution and stress in silver thin films on different substrates using x-ray diffraction
    Zoo, Yeongseok
    Alford, Terry L.
    MATERIALS, PROCESSES, INTEGRATION AND RELIABILITY IN ADVANCED INTERCONNECTS FOR MICRO- AND NANOELECTRONICS, 2007, 990 : 147 - 152
  • [4] RESIDUAL-STRESS ANALYSIS USING X-RAY DIFFRACTION
    BAUCUM, WE
    EXPERIMENTAL MECHANICS, 1971, 11 (05) : N36 - &
  • [5] X-Ray Diffraction Analysis of Residual Stress in Thin Polycrystalline Anatase Films and Elastic Anisotropy of Anatase
    Z. Matěj
    R. Kužel
    L. Nichtová
    Metallurgical and Materials Transactions A, 2011, 42 : 3323 - 3332
  • [6] X-Ray Diffraction Analysis of Residual Stress in Thin Polycrystalline Anatase Films and Elastic Anisotropy of Anatase
    Matej, Z.
    Kuzel, R.
    Nichtova, L.
    METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 2011, 42A (11): : 3323 - 3332
  • [7] Texture, residual stress and structural analysis of thin films using a combined X-ray analysis
    Lutterotti, L
    Chateigner, D
    Ferrari, S
    Ricote, J
    THIN SOLID FILMS, 2004, 450 (01) : 34 - 41
  • [8] X-ray diffraction analysis of residual stresses in textured ZnO thin films
    Dobrocka, E.
    Novak, P.
    Buc, D.
    Harmatha, L.
    Murin, J.
    APPLIED SURFACE SCIENCE, 2017, 395 : 16 - 23
  • [9] X-ray diffraction analysis residual stresses and elasticity constants in thin films
    Goudeau, P
    Renault, PO
    Badawi, KF
    Villain, P
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 2001, 56 (301): : 541 - +
  • [10] Rietveld texture and stress analysis of thin films by X-ray diffraction
    Lutterotti, L
    Matthies, S
    Chateigner, D
    Ferrari, S
    Ricote, J
    TEXTURES OF MATERIALS, PTS 1 AND 2, 2002, 408-4 : 1603 - 1608